Plasma source with a cold hollow cathode based on arc discharge; High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes; Vol. 17, № 2-3

Bibliografiske detaljer
Parent link:High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
Vol. 17, № 2-3.— 2013.— P. 127-135
Hovedforfatter: Akhmadeev Y. K.
Andre forfattere: Schanin P. M., Koval N. N. Nikolay Nikolaevich
Summary:This paper presents the results of investigation into the generation of a gas-discharge plasma by an arc source with a cold hollow cathode. The source produces a plasma of density ~1010−1011 cm−3 in a volume of ~0.5 m3 at a discharge current of up to 120 A, a discharge operating voltage of 30−40 V, and at a pressure of 0.1−1 Pa. The motion of a cathode spot in crossed electric and magnetic fields inside the hollow cathode and a special cathode design make it possible to preclude almost completely the penetration of the sputtered cathode material into the working chamber and to increase the lifetime of the cathode. Because the cathode spot operates at an integrally cold surface of the hollow cathode, the source allows generation of a chemically active gas plasma.
В фонде НТБ ТПУ отсутствует
Sprog:russisk
Udgivet: 2013
Fag:
Format: Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=602485

MARC

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200 1 |a Plasma source with a cold hollow cathode based on arc discharge  |f Y. K. Akhmadeev, P. M. Schanin , N. N. Koval 
330 |a This paper presents the results of investigation into the generation of a gas-discharge plasma by an arc source with a cold hollow cathode. The source produces a plasma of density ~1010−1011 cm−3 in a volume of ~0.5 m3 at a discharge current of up to 120 A, a discharge operating voltage of 30−40 V, and at a pressure of 0.1−1 Pa. The motion of a cathode spot in crossed electric and magnetic fields inside the hollow cathode and a special cathode design make it possible to preclude almost completely the penetration of the sputtered cathode material into the working chamber and to increase the lifetime of the cathode. Because the cathode spot operates at an integrally cold surface of the hollow cathode, the source allows generation of a chemically active gas plasma. 
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461 |t High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes 
463 |t Vol. 17, № 2-3  |v P. 127-135  |d 2013 
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701 1 |a Schanin  |b P. M. 
701 1 |a Koval  |b N. N.  |c specialist in the field of electronics  |c Professor of Tomsk Polytechnic University, Doctor of technical sciences  |f 1948-  |g Nikolay Nikolaevich  |3 (RuTPU)RU\TPU\pers\34748 
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