Plasma generation in a low-pressure hollow-cathode non-self-sustained glow discharge; High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes; Vol. 17, № 2-3
| Parent link: | High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes Vol. 17, № 2-3.— 2013.— P. 117-125 |
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| Outros Autores: | , , , |
| Resumo: | Research on a hollow-cathode non-self-sustained glow discharge demonstrates the feasibility of discharge operation at pressures from 0.1 Pa. Depending on experimental conditions, the discharge operating voltage can reach ~50 V, which is much lower than that of a self-sustained glow discharge in the same electrode system. The discharge current can range up to 30 A. The working gas is Ar, N2, and N-based gas mixtures. Probe measurements of the discharge plasma show that the electron temperature varies between 1.5 and 7 eV, depending on the pressure of gas and its kind, and the plasma density can reach 1011 cm−3 at 15-A currents. Nitriding in the discharge plasma at 600°C for 2 h made it possible to increase the hardness of Ti (VT1-0) 3.5 times and that of 12Cr18Ni10Ti three times, with a modified layer depth of 35 µm. В фонде НТБ ТПУ отсутствует |
| Idioma: | russo |
| Publicado em: |
2013
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| Assuntos: | |
| Formato: | Capítulo de Livro |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=602481 |
| Resumo: | Research on a hollow-cathode non-self-sustained glow discharge demonstrates the feasibility of discharge operation at pressures from 0.1 Pa. Depending on experimental conditions, the discharge operating voltage can reach ~50 V, which is much lower than that of a self-sustained glow discharge in the same electrode system. The discharge current can range up to 30 A. The working gas is Ar, N2, and N-based gas mixtures. Probe measurements of the discharge plasma show that the electron temperature varies between 1.5 and 7 eV, depending on the pressure of gas and its kind, and the plasma density can reach 1011 cm−3 at 15-A currents. Nitriding in the discharge plasma at 600°C for 2 h made it possible to increase the hardness of Ti (VT1-0) 3.5 times and that of 12Cr18Ni10Ti three times, with a modified layer depth of 35 µm. В фонде НТБ ТПУ отсутствует |
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