Chemical reactions at metal-solution interface going under pulsed electric discharge action; CHISA 2008, 18th International Congress of Chemical and Process Engineering, 24-28 August 2008, Praha, Czech Republic

Chemical reactions at metal-solution interface going under pulsed electric discharge action; CHISA 2008, 18th International Congress of Chemical and Process Engineering, 24-28 August 2008, Praha, Czech Republic

Bibliografske podrobnosti
Parent link:	CHISA 2008, 18th International Congress of Chemical and Process Engineering, 24-28 August 2008, Praha, Czech Republic.— 2008.— P. 1580-1581 (P5.188)
Drugi avtorji:	Yurmazova T. A. Tatyana Aleksandrovna, Saveliev G. G., Galanov A. I. Andrey Ivanovich, Yavorovskiy N. A., Danilenko N. B. Nina Borisovna
Izvleček:	В фонде НТБ ТПУ отсутствует
Jezik:	angleščina
Izdano:	2008
Teme:	труды учёных ТПУ
Format:	Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=601609

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