Chemical reactions at metal-solution interface going under pulsed electric discharge action; CHISA 2008, 18th International Congress of Chemical and Process Engineering, 24-28 August 2008, Praha, Czech Republic

Chemical reactions at metal-solution interface going under pulsed electric discharge action; CHISA 2008, 18th International Congress of Chemical and Process Engineering, 24-28 August 2008, Praha, Czech Republic

Podrobná bibliografie
Parent link:CHISA 2008, 18th International Congress of Chemical and Process Engineering, 24-28 August 2008, Praha, Czech Republic.— 2008.— P. 1580-1581 (P5.188)
Další autoři: Yurmazova T. A. Tatyana Aleksandrovna, Saveliev G. G., Galanov A. I. Andrey Ivanovich, Yavorovskiy N. A., Danilenko N. B. Nina Borisovna
Shrnutí:В фонде НТБ ТПУ отсутствует
Jazyk:angličtina
Vydáno: 2008
Témata:
труды учёных ТПУ
Médium: Kapitola
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=601609
Popis
Shrnutí:В фонде НТБ ТПУ отсутствует

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