Recent advances in surface processing with the filtered DC vacuum-arc plasma

Recent advances in surface processing with the filtered DC vacuum-arc plasma

Dades bibliogràfiques
Parent link:Vacuum
Vol. 78, iss. 2-4.— 2005.— P. 445-449
Altres autors: Ryabchikov A. I. Aleksandr Ilyich, Ryabchikov I. A., Stepanov I. B., Sivin D. O.
Sumari:Proceedings of the fifth International Conference on Ion Implantation and other Applications of Ions and Electrons (ION 2004)
The paper presents the results of investigation on formation of DC vacuum arc discharge plasma cleaned from macroparticle fraction (MF) using the electromagnetical shutter-type plasma filter (PF). It is shown that application of PFs decreases defects on the surface and in structure of deposited coatings by 102-103 times. The additional defect decrease in the case the processed surface is shifted at the distance exceeding geometric focus of PF electrodes was observed. The efficiency of plasma ion component passing through the filter () depends on the form of electrodes, electrode location with respect to direction of plasma flow expansion, electrode potential, and topography of the magnetic field formed near the PF and can be more than 50%. Decrease in surface roughness and friction coefficient, increase in hardness, wear resistance and adhesion strength were registered for TiN and TiAlN coatings formed under plasma cleaning from MF.
В фонде НТБ ТПУ отсутствует
Idioma:anglès
Publicat: 2005
Matèries:
труды учёных ТПУ
Format: Capítol de llibre
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=599629

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