Развитие методов импульсно-периодической ионной имплантации и нанесения покрытий на основе вакуумной дуги в НИИ ЯФ при ТПУ

Bibliografske podrobnosti
Parent link:6th International Conference on Modification of Materials with Particle Beams and Plasma Flows: 23-28 September, 2002, Tomsk, Russia: proceedings. С. 221-227.— , 2002
Glavni avtor: Рябчиков А. И. Александр Ильич
Drugi avtorji: Степанов И. Б. Игорь Борисович
Izvleček:Рез. англ.
The analysis of the present state-of-the-art and development trends of the new methods being developed in the NPI at TPU for pulsed and dc vacuum arc-based ion and plasma materials processing are presented. The regularities and advantages are demonstrated for the method of repetitively-pulsed multi-element implantation with changing an ion beam composition from pulse to pulse or periodically, method of high-concentration implantation with compensation of surface ion sputtering by plasma deposition, method of metallic plasma deposition under repetitively-pulsed ion mixing with ion beams and plasma flow formed in the "Raduga-5" source, and method of metal plasma-immersion implantation from including short-pulse rf implantation using repetitively-pulsed and dc vacuum arc
В фонде НТБ ТПУ отсутствует
Izdano: 2002
Teme:
Format: Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=599338
Opis
Izvleček:Рез. англ.
The analysis of the present state-of-the-art and development trends of the new methods being developed in the NPI at TPU for pulsed and dc vacuum arc-based ion and plasma materials processing are presented. The regularities and advantages are demonstrated for the method of repetitively-pulsed multi-element implantation with changing an ion beam composition from pulse to pulse or periodically, method of high-concentration implantation with compensation of surface ion sputtering by plasma deposition, method of metallic plasma deposition under repetitively-pulsed ion mixing with ion beams and plasma flow formed in the "Raduga-5" source, and method of metal plasma-immersion implantation from including short-pulse rf implantation using repetitively-pulsed and dc vacuum arc
В фонде НТБ ТПУ отсутствует