Ryabchikov A. I. Aleksandr Ilyich, Ryabchikov I. A., & Stepanov I. B. (2005). Development of filtered DC metal plasma ion implantation and coating deposition methods based on high-frequency short-pulsed bias voltage application; Vacuum; Vol. 78, iss. 2-4. 2005.
Чикаго стиль цитування (17-те видання)Ryabchikov A. I. Aleksandr Ilyich, Ryabchikov I. A., та Stepanov I. B. Development of Filtered DC Metal Plasma Ion Implantation and Coating Deposition Methods Based on High-frequency Short-pulsed Bias Voltage Application; Vacuum; Vol. 78, Iss. 2-4. 2005, 2005.
Стиль цитування MLA (9-ме видання)Ryabchikov A. I. Aleksandr Ilyich, et al. Development of Filtered DC Metal Plasma Ion Implantation and Coating Deposition Methods Based on High-frequency Short-pulsed Bias Voltage Application; Vacuum; Vol. 78, Iss. 2-4. 2005, 2005.