Isotope distribution in electrochemical ion implantation in metals and composite materials; Russian Journal of Electrochemistry; Vol. 46, № 1

Isotope distribution in electrochemical ion implantation in metals and composite materials; Russian Journal of Electrochemistry; Vol. 46, № 1

Chi tiết về thư mục
Parent link:	Russian Journal of Electrochemistry.— , 1965- Vol. 46, № 1.— 2010.— P. 112-115
Tác giả chính:	Larionov V. V. Vitaliy Vasilyevich
Tác giả khác:	Nikitenkov N. N., Tyurin Yu. I. Yuri Ivanovich
Tóm tắt:	Experimental data are reported for the isotope distribution in the electrochemical implantation of lithium and hydrogen isotopes in metals and composite materials from LiOD and LiOH solutions. General regularities are identified for the changes in isotopic composition in the metal-matrix in which ions are implanted, in impurities in the metals, and in the ions responsible for electrolyte conductivity. Possible mechanisms for lithium implantation are considered on the basis of the analysis of isotope distribution. В фонде НТБ ТПУ отсутствует
Ngôn ngữ:	Tiếng Anh
Được phát hành:	2010
Những chủ đề:	труды учёных ТПУ
Định dạng:	Chương của sách
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=598806

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