The Raduga multipurpose ion/plasma source for surface modification of construction materials; Nuclear Instruments and Methods in Physics Research. Sec. B: PART1; Vol. 59-60
| Parent link: | Nuclear Instruments and Methods in Physics Research. Sec. B: PART1 Vol. 59-60.— 1991.— P. 124-127 |
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| Andre forfattere: | , , , |
| Summary: | In this article a repetitively pulsed vacuum arc ion/plasma source for property modification of near-surface layers in construction materials is described. The Raduga ion source provides both high concentration implantation and optimum two-element implantation. These advantages can be achieved by using not only pure single-element or mixed fluxes, but also pulsed beam sequences with controllable composition and energy of each ion species. Another unique feature of the source is its ability to generate a sequence consisting of ion beam and plasma stream pulses. Switching between ion irradiation and plasma deposition can be done from pulse to pulse, within each pulse, or after accumulation of a required dose. Two-element operating conditions provide the possibility of compensating for sputtering during implantation by neutral atom and plasma deposition. The technological capabilities of the source are: (a) single-element ion implantation; (b) multi-element implantation using compositional cathodes; (c) multi-element implantation with beam composition and ion energy controlled during irradiation and even from pulse to pulse; (d) high-concentration implantation; (e) thin-film deposition; and (f) thin-film deposition under ion irradiation conditions. В фонде НТБ ТПУ отсутствует |
| Sprog: | engelsk |
| Udgivet: |
1991
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| Fag: | |
| Format: | Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=596507 |
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| 200 | 1 | |a The Raduga multipurpose ion/plasma source for surface modification of construction materials |f A. I. Ryabchikov [et al.] | |
| 330 | |a In this article a repetitively pulsed vacuum arc ion/plasma source for property modification of near-surface layers in construction materials is described. The Raduga ion source provides both high concentration implantation and optimum two-element implantation. These advantages can be achieved by using not only pure single-element or mixed fluxes, but also pulsed beam sequences with controllable composition and energy of each ion species. Another unique feature of the source is its ability to generate a sequence consisting of ion beam and plasma stream pulses. Switching between ion irradiation and plasma deposition can be done from pulse to pulse, within each pulse, or after accumulation of a required dose. Two-element operating conditions provide the possibility of compensating for sputtering during implantation by neutral atom and plasma deposition. The technological capabilities of the source are: (a) single-element ion implantation; (b) multi-element implantation using compositional cathodes; (c) multi-element implantation with beam composition and ion energy controlled during irradiation and even from pulse to pulse; (d) high-concentration implantation; (e) thin-film deposition; and (f) thin-film deposition under ion irradiation conditions. | ||
| 333 | |a В фонде НТБ ТПУ отсутствует | ||
| 461 | |t Nuclear Instruments and Methods in Physics Research. Sec. B: PART1 | ||
| 463 | |t Vol. 59-60 |v P. 124-127 |d 1991 | ||
| 610 | 1 | |a труды учёных ТПУ | |
| 701 | 1 | |a Ryabchikov |b A. I. |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |c physicist |f 1950- |g Aleksandr Ilyich |3 (RuTPU)RU\TPU\pers\30912 | |
| 701 | 1 | |a Arsubov |b N. M. | |
| 701 | 1 | |a Vasilyiev |b N. A. | |
| 701 | 1 | |a Dektyarev |b S. V. | |
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