Properties of Ti coatings deposited by high-power ion beams

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Parent link:Inorganic Materials: Applied Research
Vol. 3, № 3.— 2012.— P. 220-225
Tác giả khác: Struts V. K., Matvienko V. M., Petrov A. V., Ryabchikov A. I. Aleksandr Ilyich
Tóm tắt:Titanium coatings are deposited on a Si substrate by their deposition from ablation plasma produced by irradiating a Ti target with high-power ion beams. The dependences of the adhesion, nanohardness, Young's modulus, and friction coefficient on the distance between the sputtered target and the substrate and on the thickness of the coating are studied for thin-film titanium coatings. The formation of a transition layer with an alternating content of Ti is found to increase coating adhesion.
В фонде НТБ ТПУ отсутствует
Ngôn ngữ:Tiếng Anh
Được phát hành: 2012
Những chủ đề:
Định dạng: Chương của sách
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=596381

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200 1 |a Properties of Ti coatings deposited by high-power ion beams  |f V. K. Struts [et al.] 
330 |a Titanium coatings are deposited on a Si substrate by their deposition from ablation plasma produced by irradiating a Ti target with high-power ion beams. The dependences of the adhesion, nanohardness, Young's modulus, and friction coefficient on the distance between the sputtered target and the substrate and on the thickness of the coating are studied for thin-film titanium coatings. The formation of a transition layer with an alternating content of Ti is found to increase coating adhesion. 
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463 |t Vol. 3, № 3  |v P. 220-225  |d 2012 
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701 1 |a Ryabchikov  |b A. I.  |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences  |c physicist  |f 1950-  |g Aleksandr Ilyich  |3 (RuTPU)RU\TPU\pers\30912 
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