Influence of Deposition Conditions on Characteristics of Fullerenes Containing Carbonic Coatings Obtained Using High-Power Ion Beams; Известия вузов. Физика; Т. 49, № 8

Dettagli Bibliografici
Parent link:Известия вузов. Физика/ Министерство общего и профессионального образования Российской Федерации ; Томский Госуниверситет.— , 1958-.— 0021-3411
Т. 49, № 8.— 2006.— P. 497-500
Altri autori: Struts V. K., Matvienko V. M., Petrov A.V., Ryabchikov A. I. Aleksandr Ilyich, Usov Y. P. Yuri Petrovich, Naiden E. P., Renk T. J., Fortuna S. V.
Riassunto:А possibility of obtaining thin carbon films with high content of fullerene mixture С60 and С70 using the method of sputtering graphite targets by high power pulsed ion beams (HPIBs) is shown. Investigation of films structural and phase composition was performed by the methods of transmission electron microscopy (TEM) and X ray diffraction analysis (XRDA). It is shown that the formation of fullerenes depends on the parameters defining the conditions of carbon vapor condensation in a scattering vapor plasma jet.Optimal conditions for target sputtering are defined and a possibility of controlling the composition and amount of fullerenes in films is demonstrated.
Lingua:inglese
Pubblicazione: 2006
Soggetti:
Natura: MixedMaterials Capitolo di libro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=463782

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200 1 |a Influence of Deposition Conditions on Characteristics of Fullerenes Containing Carbonic Coatings Obtained Using High-Power Ion Beams  |f V. K. Struts [et al.] 
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330 |a А possibility of obtaining thin carbon films with high content of fullerene mixture С60 and С70 using the method of sputtering graphite targets by high power pulsed ion beams (HPIBs) is shown. Investigation of films structural and phase composition was performed by the methods of transmission electron microscopy (TEM) and X ray diffraction analysis (XRDA). It is shown that the formation of fullerenes depends on the parameters defining the conditions of carbon vapor condensation in a scattering vapor plasma jet.Optimal conditions for target sputtering are defined and a possibility of controlling the composition and amount of fullerenes in films is demonstrated. 
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701 1 |a Ryabchikov  |b A. I.  |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences  |c physicist  |f 1950-  |g Aleksandr Ilyich  |2 stltpush  |3 (RuTPU)RU\TPU\pers\30912 
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