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Advanced Methods for Deposition of Thin Films: Monitoring, Properties, Application

Advanced Methods for Deposition of Thin Films: Monitoring, Properties, Application

Dettagli Bibliografici
Ente Autore: Masaryk University
Altri autori: Brablec A. Antonin (редактор), Buchta J. Jiri, Bursikova V. Vilma, Jasek O. Ondrej, Kudrle V. Vit, Slavicek P. Pavel, Trunec D. David, Zajickova L. Lenka, Protasevich E. T.
Lingua:inglese
Pubblicazione: Tomsk, 2002
Soggetti:
физическая химия
тонкие пленки
отложения
контроль
свойства
применение
английский язык
Natura: Libro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=40342
  • Posseduto
  • Descrizione
  • Documenti analoghi
  • MARC21

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    Pubblicazione: (New York, North-Holland, 1986)
  • Structural features of N-containing titanium dioxide thin films deposited by magnetron sputtering; Thin Solid Films; Vol. 627
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    Pubblicazione: (2014)
  • Thin Films and Multilayers for Electronics: study aid
    Pubblicazione: (Tomsk, TPU Publishing House, 2009)