Mechanical Properties of Titanium Films Deposited by Pulsed High-Power Ion Beams

Mechanical Properties of Titanium Films Deposited by Pulsed High-Power Ion Beams

Bibliografiska uppgifter
Parent link:7th International Conference on Modification of Materials with Particle Beams and Plasma Flows (Tomsk, Russia, 25-30 July 2004): proceedings/ Tomsk Polytechnic University (TPU) ; ed. S. Korovin, A. Ryabchikov. P. 465-468.— , 2004.— 5-94458-042-9
Övriga upphovsmän: Struts V. K., Matvienko V. M., Petrov A. V., Ryabchikov A. I. Aleksandr Ilyich, Shlapakovski A. S.
Sammanfattning:The adhesion of a titanium film to a silicon substrate, film nanohardness, Youngmodulus, and other properties have been investigated depending on a distance from a sputtered target to substrate and a thickness of the deposited film. Films were deposited from the ablation plasma formed under a pulsed high-power ion beam impinging on the titanium target. The analysis of experimental data has shown that at a given film thickness, the adhesion strength increases with increasing target-substrate distance; this dependence is stronger for thinner films. Adhesion significantly reduces as the film thickness increases, and this dependence is stronger at larger targetsubstrate distances. The friction coefficient of a diamond Rockwell indenter moving along the film considerably decreases, whereas the film nanohardness and Young modulus at a given indentation load grow as the target-substrate distance increases
Publicerad: 2004
Ämnen:
труды учёных ТПУ
Materialtyp: Bokavsnitt
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=239746

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