Mechanical Properties of Titanium Films Deposited by Pulsed High-Power Ion Beams; 7th International Conference on Modification of Materials with Particle Beams and Plasma Flows (Tomsk, Russia, 25-30 July 2004)

Mechanical Properties of Titanium Films Deposited by Pulsed High-Power Ion Beams; 7th International Conference on Modification of Materials with Particle Beams and Plasma Flows (Tomsk, Russia, 25-30 July 2004)

書目詳細資料
Parent link:	7th International Conference on Modification of Materials with Particle Beams and Plasma Flows (Tomsk, Russia, 25-30 July 2004).— 2004.— P. 465-468
其他作者:	Struts V. K., Matvienko V. M., Petrov A. V., Ryabchikov A. I. Aleksandr Ilyich, Shlapakovski A. S.
總結:	The adhesion of a titanium film to a silicon substrate, film nanohardness, Youngmodulus, and other properties have been investigated depending on a distance from a sputtered target to substrate and a thickness of the deposited film. Films were deposited from the ablation plasma formed under a pulsed high-power ion beam impinging on the titanium target. The analysis of experimental data has shown that at a given film thickness, the adhesion strength increases with increasing target-substrate distance; this dependence is stronger for thinner films. Adhesion significantly reduces as the film thickness increases, and this dependence is stronger at larger targetsubstrate distances. The friction coefficient of a diamond Rockwell indenter moving along the film considerably decreases, whereas the film nanohardness and Young modulus at a given indentation load grow as the target-substrate distance increases
語言:	俄语
出版:	2004
主題:	труды учёных ТПУ
格式:	Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=239746

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