Detalhes bibliográficos
| Parent link: | 7th International Conference on Modification of Materials with Particle Beams and Plasma Flows (Tomsk, Russia, 25-30 July 2004).— 2004.— P. 465-468 |
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| Outros Autores: |
Struts V. K.,
Matvienko V. M.,
Petrov A. V.,
Ryabchikov A. I. Aleksandr Ilyich,
Shlapakovski A. S. |
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| Resumo: | The adhesion of a titanium film to a silicon substrate, film nanohardness, Youngmodulus, and other properties have been investigated depending on a distance from a sputtered target to substrate and a thickness of the deposited film. Films were deposited from the ablation plasma formed under a pulsed high-power ion beam impinging on the titanium target. The analysis of experimental data has shown that at a given film thickness, the adhesion strength increases with increasing target-substrate distance; this dependence is stronger for thinner films. Adhesion significantly reduces as the film thickness increases, and this dependence is stronger at larger targetsubstrate distances. The friction coefficient of a diamond Rockwell indenter moving along the film considerably decreases, whereas the film nanohardness and Young modulus at a given indentation load grow as the target-substrate distance increases |
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| Idioma: | russo |
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| Publicado em: |
2004
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| Assuntos: | |
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| Formato: | Capítulo de Livro
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| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=239746 |
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