Mechanical Properties of Titanium Films Deposited by Pulsed High-Power Ion Beams; 7th International Conference on Modification of Materials with Particle Beams and Plasma Flows (Tomsk, Russia, 25-30 July 2004)

Xehetasun bibliografikoak
Parent link:7th International Conference on Modification of Materials with Particle Beams and Plasma Flows (Tomsk, Russia, 25-30 July 2004).— 2004.— P. 465-468
Beste egile batzuk: Struts V. K., Matvienko V. M., Petrov A. V., Ryabchikov A. I. Aleksandr Ilyich, Shlapakovski A. S.
Gaia:The adhesion of a titanium film to a silicon substrate, film nanohardness, Youngmodulus, and other properties have been investigated depending on a distance from a sputtered target to substrate and a thickness of the deposited film. Films were deposited from the ablation plasma formed under a pulsed high-power ion beam impinging on the titanium target. The analysis of experimental data has shown that at a given film thickness, the adhesion strength increases with increasing target-substrate distance; this dependence is stronger for thinner films. Adhesion significantly reduces as the film thickness increases, and this dependence is stronger at larger targetsubstrate distances. The friction coefficient of a diamond Rockwell indenter moving along the film considerably decreases, whereas the film nanohardness and Young modulus at a given indentation load grow as the target-substrate distance increases
Hizkuntza:errusiera
Argitaratua: 2004
Gaiak:
Formatua: Liburu kapitulua
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=239746

MARC

LEADER 00000naa2a2200000 4500
001 239746
005 20231031205523.0
035 |a (RuTPU)RU\TPU\book\260971 
035 |a RU\TPU\book\260932 
090 |a 239746 
100 |a 20130613d2004 k y0rusy50 ca 
101 0 |a rus 
102 |a RU 
200 1 |a Mechanical Properties of Titanium Films Deposited by Pulsed High-Power Ion Beams  |f V. K. Struts [et al.] 
320 |a References: p. 468 (10 tit.) 
330 |a The adhesion of a titanium film to a silicon substrate, film nanohardness, Youngmodulus, and other properties have been investigated depending on a distance from a sputtered target to substrate and a thickness of the deposited film. Films were deposited from the ablation plasma formed under a pulsed high-power ion beam impinging on the titanium target. The analysis of experimental data has shown that at a given film thickness, the adhesion strength increases with increasing target-substrate distance; this dependence is stronger for thinner films. Adhesion significantly reduces as the film thickness increases, and this dependence is stronger at larger targetsubstrate distances. The friction coefficient of a diamond Rockwell indenter moving along the film considerably decreases, whereas the film nanohardness and Young modulus at a given indentation load grow as the target-substrate distance increases 
463 1 |0 (RuTPU)RU\TPU\book\95222  |y 5-94458-042-9  |t 7th International Conference on Modification of Materials with Particle Beams and Plasma Flows (Tomsk, Russia, 25-30 July 2004)  |o proceedings  |f Tomsk Polytechnic University (TPU) ; ed. S. Korovin, A. Ryabchikov  |v P. 465-468  |d 2004  |p 519 p. 
610 1 |a труды учёных ТПУ 
701 1 |a Struts  |b V. K. 
701 1 |a Matvienko  |b V. M. 
701 1 |a Petrov  |b A. V. 
701 1 |a Ryabchikov  |b A. I.  |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences  |c physicist  |f 1950-  |g Aleksandr Ilyich  |2 stltpush  |3 (RuTPU)RU\TPU\pers\30912 
701 1 |a Shlapakovski  |b A. S. 
801 1 |a RU  |b 63413507  |c 20130613 
801 2 |a RU  |b 63413507  |c 20130718  |g RCR 
942 |c BK