PVD of coatings based on plasma filter application

Bibliographische Detailangaben
Parent link:Korus 2001: The 5th Korea-Russia International Symposium on Science and Technology, June 26 - July 3, 2001, Tomsk/ Tomsk Polytechnic University (TPU) ; KORUS.— , 2001-
Vol. 1.— 2001.— P. 383-386
1. Verfasser: Ryabchikov A. I. Aleksandr Ilyich
Weitere Verfasser: Stepanov I. B. Igor Borisovich, Shulepov I. A. Ivan Anisimovich
Zusammenfassung:The paper presents the results of investigating the formation of vacuum-arc plasma flow cleaned from the microparticle fraction. The plasma filter design is based on plasma spread in a channel formed by electrodes located at an angle with the axis of an arc evaporator. The effects of magnetic insulation of the electrodes and the positive near-electrode potential drop on the mechanisms of charged plasma component spread are investigated. The results of the obtained experimental data are discussed
Veröffentlicht: 2001
Schlagworte:
Format: Buchkapitel
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=239354
Beschreibung
Zusammenfassung:The paper presents the results of investigating the formation of vacuum-arc plasma flow cleaned from the microparticle fraction. The plasma filter design is based on plasma spread in a channel formed by electrodes located at an angle with the axis of an arc evaporator. The effects of magnetic insulation of the electrodes and the positive near-electrode potential drop on the mechanisms of charged plasma component spread are investigated. The results of the obtained experimental data are discussed