Investigation of Tungsten DC Vacuum Arc Characteristics. Technological Application; 7 International conference on modification of materials with particle beams and plasma flows
| Parent link: | 7 International conference on modification of materials with particle beams and plasma flows.— 2004.— [P. 1-5] |
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| Autor principal: | |
| Altres autors: | , |
| Sumari: | Title from the title-page. The paper presents the results of investigation of regularities of generation of W vacuum arc plasma continuous flows and their application for deposition of coatings with high adhesion strength. The developed construction of the vacuum arc evaporator (VAE) ensures dc mode of W plasma generation in the current range of 350 A - 750 A at arc voltage drop of more than 40 V. It is shown that at discharge current of 750 A W coating deposition rate can achieve 80 μm/h, which offers attractive perspectives for a number of technological applications of W plasma. We also investigated some regularities of changes in element composition, adhesion strength, hardness, morphology and structure of W coatings formed from plasma of a dc vacuum arc discharge (VAD) depending on regimes of coating deposition. It is shown that use of Ti plasma for generation of a thick transition and damping layer under the regime of plasma immersion ion implantation and coating deposition under intensive ion mixing allows increase adhesion strength of W coatings by several times. Режим доступа: из корпоративной сети ТПУ Text files |
| Idioma: | anglès |
| Publicat: |
2004
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| Matèries: | |
| Accés en línia: | http://www.lib.tpu.ru/fulltext2/c/2004/C13/054.pdf |
| Format: | Electrònic Capítol de llibre |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=234138 |
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| 200 | 1 | |a Investigation of Tungsten DC Vacuum Arc Characteristics. Technological Application |f I. B. Stepanov, A. I. Ryabchikov, S. V. Dektyarev | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title from the title-page. | ||
| 320 | |a [References: p. 5 (6 tit.)] | ||
| 330 | |a The paper presents the results of investigation of regularities of generation of W vacuum arc plasma continuous flows and their application for deposition of coatings with high adhesion strength. The developed construction of the vacuum arc evaporator (VAE) ensures dc mode of W plasma generation in the current range of 350 A - 750 A at arc voltage drop of more than 40 V. It is shown that at discharge current of 750 A W coating deposition rate can achieve 80 μm/h, which offers attractive perspectives for a number of technological applications of W plasma. We also investigated some regularities of changes in element composition, adhesion strength, hardness, morphology and structure of W coatings formed from plasma of a dc vacuum arc discharge (VAD) depending on regimes of coating deposition. It is shown that use of Ti plasma for generation of a thick transition and damping layer under the regime of plasma immersion ion implantation and coating deposition under intensive ion mixing allows increase adhesion strength of W coatings by several times. | ||
| 333 | |a Режим доступа: из корпоративной сети ТПУ | ||
| 336 | |a Text files | ||
| 337 | |a Adobe Reader | ||
| 463 | 1 | |0 (RuTPU)RU\TPU\book\75459 |t 7 International conference on modification of materials with particle beams and plasma flows |o Tomsk, Russia, 25-29 July 2004 |f edited by S. Korovin, A. Ryabchikov |v [P. 1-5] |d 2004 | |
| 610 | 1 | |a физика | |
| 610 | 1 | |a плазма | |
| 610 | 1 | |a вакуумные дуги | |
| 610 | 1 | |a генерация | |
| 610 | 1 | |a разрядный ток | |
| 610 | 1 | |a покрытия | |
| 610 | 1 | |a осаждение | |
| 610 | 1 | |a разряды | |
| 610 | 1 | |a ионная имплантация | |
| 610 | 1 | |a технологическое применение | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a электронный ресурс | |
| 700 | 1 | |a Stepanov |b I. B. |c physicist |c Head of the laboratory of Tomsk Polytechnic University, Doctor of technical sciences |f 1968- |g Igor Borisovich |3 (RuTPU)RU\TPU\pers\34218 | |
| 701 | 1 | |a Ryabchikov |b A. I. |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |c physicist |f 1950- |g Aleksandr Ilyich |3 (RuTPU)RU\TPU\pers\30912 | |
| 701 | 1 | |a Dektyarev |b S. V. |c physicist |c design engineer of Tomsk Polytechnic University |f 1957- |g Sergey Valentinovich |3 (RuTPU)RU\TPU\pers\35672 | |
| 801 | 1 | |a RU |b 63413507 |c 20120118 | |
| 801 | 2 | |a RU |b 63413507 |c 20161229 |g RCR | |
| 856 | 4 | |u http://www.lib.tpu.ru/fulltext2/c/2004/C13/054.pdf | |
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