Mechanical Properties of Titanium Films Deposited by Pulsed High-Power Ion Beams; 7 International conference on modification of materials with particle beams and plasma flows

Mechanical Properties of Titanium Films Deposited by Pulsed High-Power Ion Beams; 7 International conference on modification of materials with particle beams and plasma flows

Podrobná bibliografie
Parent link:7 International conference on modification of materials with particle beams and plasma flows.— 2004.— [P. 465-468]
Další autoři: Struts V. K., Matvienko V. M., Petrov A. V., Ryabchikov A. I. Aleksandr Ilyich, Shlapakovski A. S.
Shrnutí:Title from the title-page.
The adhesion of a titanium film to a silicon substrate, film nanohardness, Young modulus, and other properties have been investigated depending on a distance from a sputtered target to substrate and a thickness of the deposited film. Films were deposited from the ablation plasma formed under a pulsed high-power ion beam impinging on the titanium target. The analysis of experimental data has shown that at a given film thickness, the adhesion strength increases with increasing target-substrate distance; this dependence is stronger for thinner films. Adhesion significantly reduces as the film thickness increases, and this dependence is stronger at larger target-substrate distances. The friction coefficient of a diamond Rockwell indenter moving along the film considerably decreases, whereas the film nanohardness and Young modulus at a given indentation load grow as the target-substrate distance increases.
Режим доступа: из корпоративной сети ТПУ
Text files
Jazyk:angličtina
Vydáno: 2004
Edice:Coating deposition
Témata:
физика
плазма
титан
механические свойства
тонкие пленки
ионные пучки
импульсные пучки
мощные пучки
труды учёных ТПУ
электронный ресурс
On-line přístup:http://www.lib.tpu.ru/fulltext2/c/2004/C13/051.pdf
Médium: Elektronický zdroj Kapitola
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=234121

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