Mechanical Properties of Titanium Films Deposited by Pulsed High-Power Ion Beams; 7 International conference on modification of materials with particle beams and plasma flows
| Parent link: | 7 International conference on modification of materials with particle beams and plasma flows.— 2004.— [P. 465-468] |
|---|---|
| অন্যান্য লেখক: | , , , , |
| সংক্ষিপ্ত: | Title from the title-page. The adhesion of a titanium film to a silicon substrate, film nanohardness, Young modulus, and other properties have been investigated depending on a distance from a sputtered target to substrate and a thickness of the deposited film. Films were deposited from the ablation plasma formed under a pulsed high-power ion beam impinging on the titanium target. The analysis of experimental data has shown that at a given film thickness, the adhesion strength increases with increasing target-substrate distance; this dependence is stronger for thinner films. Adhesion significantly reduces as the film thickness increases, and this dependence is stronger at larger target-substrate distances. The friction coefficient of a diamond Rockwell indenter moving along the film considerably decreases, whereas the film nanohardness and Young modulus at a given indentation load grow as the target-substrate distance increases. Режим доступа: из корпоративной сети ТПУ Text files |
| ভাষা: | ইংরেজি |
| প্রকাশিত: |
2004
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| মালা: | Coating deposition |
| বিষয়গুলি: | |
| অনলাইন ব্যবহার করুন: | http://www.lib.tpu.ru/fulltext2/c/2004/C13/051.pdf |
| বিন্যাস: | বৈদ্যুতিক গ্রন্থের অধ্যায় |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=234121 |
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