Mechanical Properties of Titanium Films Deposited by Pulsed High-Power Ion Beams; 7 International conference on modification of materials with particle beams and plasma flows
| Parent link: | 7 International conference on modification of materials with particle beams and plasma flows.— 2004.— [P. 465-468] |
|---|---|
| Altres autors: | , , , , |
| Sumari: | Title from the title-page. The adhesion of a titanium film to a silicon substrate, film nanohardness, Young modulus, and other properties have been investigated depending on a distance from a sputtered target to substrate and a thickness of the deposited film. Films were deposited from the ablation plasma formed under a pulsed high-power ion beam impinging on the titanium target. The analysis of experimental data has shown that at a given film thickness, the adhesion strength increases with increasing target-substrate distance; this dependence is stronger for thinner films. Adhesion significantly reduces as the film thickness increases, and this dependence is stronger at larger target-substrate distances. The friction coefficient of a diamond Rockwell indenter moving along the film considerably decreases, whereas the film nanohardness and Young modulus at a given indentation load grow as the target-substrate distance increases. Режим доступа: из корпоративной сети ТПУ Text files |
| Idioma: | anglès |
| Publicat: |
2004
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| Col·lecció: | Coating deposition |
| Matèries: | |
| Accés en línia: | http://www.lib.tpu.ru/fulltext2/c/2004/C13/051.pdf |
| Format: | Electrònic Capítol de llibre |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=234121 |
MARC
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| 200 | 1 | |a Mechanical Properties of Titanium Films Deposited by Pulsed High-Power Ion Beams |f V. K. Struts [et al.] | |
| 203 | |a Text |c electronic | ||
| 225 | 1 | |a Coating deposition | |
| 300 | |a Title from the title-page. | ||
| 320 | |a [References: p. 468 (10 tit.)] | ||
| 330 | |a The adhesion of a titanium film to a silicon substrate, film nanohardness, Young modulus, and other properties have been investigated depending on a distance from a sputtered target to substrate and a thickness of the deposited film. Films were deposited from the ablation plasma formed under a pulsed high-power ion beam impinging on the titanium target. The analysis of experimental data has shown that at a given film thickness, the adhesion strength increases with increasing target-substrate distance; this dependence is stronger for thinner films. Adhesion significantly reduces as the film thickness increases, and this dependence is stronger at larger target-substrate distances. The friction coefficient of a diamond Rockwell indenter moving along the film considerably decreases, whereas the film nanohardness and Young modulus at a given indentation load grow as the target-substrate distance increases. | ||
| 333 | |a Режим доступа: из корпоративной сети ТПУ | ||
| 336 | |a Text files | ||
| 337 | |a Adobe Reader | ||
| 463 | 1 | |0 (RuTPU)RU\TPU\book\75459 |t 7 International conference on modification of materials with particle beams and plasma flows |o Tomsk, Russia, 25-29 July 2004 |f edited by S. Korovin, A. Ryabchikov |v [P. 465-468] |d 2004 | |
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| 701 | 1 | |a Struts |b V. K. | |
| 701 | 1 | |a Matvienko |b V. M. | |
| 701 | 1 | |a Petrov |b A. V. | |
| 701 | 1 | |a Ryabchikov |b A. I. |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |c physicist |f 1950- |g Aleksandr Ilyich |3 (RuTPU)RU\TPU\pers\30912 | |
| 701 | 1 | |a Shlapakovski |b A. S. | |
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