Program-Controlled High-Voltage Pulse Generator for Ion Beams Source; 7 International conference on modification of materials with particle beams and plasma flows
| Источник: | 7 International conference on modification of materials with particle beams and plasma flows.— 2004.— [P. 101-103] |
|---|---|
| Главный автор: | |
| Примечания: | Title from the title-page. Designed in the Nuclear Physics Institute a vacuum arc source of plasma and accelerated ions "Raduga-5" [1] can be used for materials modification by various methods (plasma sputtering, ion implantation, combined methods of treatment). The group of technical solutions used at "Raduga-5" design allow to vary in the wide range the plasma concentration and the ion beam current density. But it must be noted the reaction pattern of the source on the load for the control of high voltage pulsed generator (HVPG). In a particular case we can consider the load as plasma filled diode. When we use the linear law of high voltage pulses generation control the unjustified energy deposition appears at the source elements by episodically current overloads. There is also a probability of essential voltage exceeding at the power system elements at the instant load resistance increase (arc discharge breakdown in the plasma and ions source). Режим доступа: из корпоративной сети ТПУ Text files |
| Язык: | английский |
| Опубликовано: |
2004
|
| Серии: | Beam and plasma sources |
| Предметы: | |
| Online-ссылка: | http://www.lib.tpu.ru/fulltext2/c/2004/C13/034.pdf |
| Формат: | Электронный ресурс Статья |
| Запись в KOHA: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=231967 |
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