Program-Controlled High-Voltage Pulse Generator for Ion Beams Source
| Parent link: | 7 International conference on modification of materials with particle beams and plasma flows: Tomsk, Russia, 25-29 July 2004/ edited by S. Korovin, A. Ryabchikov. [P. 101-103].— , 2004 |
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| Hovedforfatter: | |
| Summary: | Title from the title-page. Designed in the Nuclear Physics Institute a vacuum arc source of plasma and accelerated ions "Raduga-5" [1] can be used for materials modification by various methods (plasma sputtering, ion implantation, combined methods of treatment). The group of technical solutions used at "Raduga-5" design allow to vary in the wide range the plasma concentration and the ion beam current density. But it must be noted the reaction pattern of the source on the load for the control of high voltage pulsed generator (HVPG). In a particular case we can consider the load as plasma filled diode. When we use the linear law of high voltage pulses generation control the unjustified energy deposition appears at the source elements by episodically current overloads. There is also a probability of essential voltage exceeding at the power system elements at the instant load resistance increase (arc discharge breakdown in the plasma and ions source). Режим доступа: из корпоративной сети ТПУ Text files |
| Sprog: | engelsk |
| Udgivet: |
2004
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| Serier: | Beam and plasma sources |
| Fag: | |
| Online adgang: | http://www.lib.tpu.ru/fulltext2/c/2004/C13/034.pdf |
| Format: | Electronisk Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=231967 |
MARC
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| 200 | 1 | |a Program-Controlled High-Voltage Pulse Generator for Ion Beams Source |b Electronic resource |f S. V. Dektyarev | |
| 203 | |a Text |c electronic | ||
| 225 | 1 | |a Beam and plasma sources | |
| 230 | |a Electronic text data (1 file : 364 Kb) | ||
| 300 | |a Title from the title-page. | ||
| 320 | |a [References: p. 103 (5 tit.)] | ||
| 330 | |a Designed in the Nuclear Physics Institute a vacuum arc source of plasma and accelerated ions "Raduga-5" [1] can be used for materials modification by various methods (plasma sputtering, ion implantation, combined methods of treatment). The group of technical solutions used at "Raduga-5" design allow to vary in the wide range the plasma concentration and the ion beam current density. But it must be noted the reaction pattern of the source on the load for the control of high voltage pulsed generator (HVPG). In a particular case we can consider the load as plasma filled diode. When we use the linear law of high voltage pulses generation control the unjustified energy deposition appears at the source elements by episodically current overloads. There is also a probability of essential voltage exceeding at the power system elements at the instant load resistance increase (arc discharge breakdown in the plasma and ions source). | ||
| 333 | |a Режим доступа: из корпоративной сети ТПУ | ||
| 336 | |a Text files | ||
| 337 | |a Adobe Reader | ||
| 463 | 1 | |0 (RuTPU)RU\TPU\book\75459 |t 7 International conference on modification of materials with particle beams and plasma flows |o Tomsk, Russia, 25-29 July 2004 |f edited by S. Korovin, A. Ryabchikov |v [P. 101-103] |d 2004 |p 1 Multimedia CD-ROM | |
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| 700 | 1 | |a Dektyarev |b S. V. |c physicist |c design engineer of Tomsk Polytechnic University |f 1957- |g Sergey Valentinovich |2 stltpush |3 (RuTPU)RU\TPU\pers\35672 | |
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