Obtaining antireflection optical coatings by using dual magnetron sputtering system
| Parent link: | Modern technique and technologies MTT' 2012.— 2012.— [С. 173-174] |
|---|---|
| मुख्य लेखक: | Khodyrevskaya Y. I. |
| निगमित लेखक: | National Research Tomsk Polytechnic University |
| अन्य लेखक: | Romanenko S. E. (научный руководитель) |
| सारांश: | Заглавие с титульного листа |
| भाषा: | अंग्रेज़ी |
| प्रकाशित: |
2012
|
| श्रृंखला: | Section VIII: Modern Physical Methods in Science, Engineering and Medicine |
| विषय: | |
| ऑनलाइन पहुंच: | http://www.lib.tpu.ru/fulltext/v/Conferences/2012/C2/ENG/eng_080.pdf |
| स्वरूप: | इलेक्ट्रोनिक पुस्तक अध्याय |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=227940 |
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समान संसाधन
-
Technological features of the dual magnetron sputtering system for reactive deposition of thin film coatings
द्वारा: Sidelev D. V. Dmitry Vladimirovich
प्रकाशित: (2012) -
Magnetron sputtering system
द्वारा: Lazarev A. V.
प्रकाशित: (2015) -
Energy Flux at the Substrate During Dual Magnetron Sputtering of TiAlN Coating
प्रकाशित: (2023) -
Optical Absorption Peculiarities of Al-Si-N Coatings Produced by Magnetron Sputtering
प्रकाशित: (2016) -
Peculiarities of metal coatings deposition using magnetron sputtering systems with hot and evaporative targets
प्रकाशित: (2018)