High-frequency short-pulse bias potential as a universal method of Ion-beam and plasma treatment of conductive and dielectric materials using vacuum-arc and ablation plasma

High-frequency short-pulse bias potential as a universal method of Ion-beam and plasma treatment of conductive and dielectric materials using vacuum-arc and ablation plasma

Bibliographische Detailangaben
Parent link:10th International Conference on Modification of Materials with Particle Beams and Plasma Flows, Tomsk, 19-24 September 2010: proceedings/ Tomsk Polytechnic University (TPU) ; Institute of High Current Electronics SB RAS ; High voltage research institute Tomsk Polytechnic University ; Nuclear Physics institute Tomsk Polytechnic University. P. 124-127.— , 2010.— 978-5-94458-112-9
Weitere Verfasser: Ryabchikov A. I. Aleksandr Ilyich, Stepanov I. B. Igor Borisovich, Sivin D. O. Denis Olegovich, Shulepov I. A. Ivan Anisimovich
Zusammenfassung:The results of investigations of applicability of the method of high-frequency short-pulsedplasma-immersion ion implantation and (or) coating deposition using vacuum-arc and ablationplasma to conductive and dielectric substrates are presented. It is shown that ion implantation with the ion sputtering compensation by coating deposition from plasma and ion-assisted coating deposition can be realized for the metal and dielectric samples through alteration of the negative bias potential within 0-4 ⋅ 103 V, with the pulse repetition rate of (1-4.4) ⋅ 105 pps, pulse duration 0.5-2 μs and duty factor of 0.1-0.9. It is experimentally established that at coating deposition from ablation plasma obtained by the influence of the high-intensity ion beam (j = 3 ⋅ 102 A/m2, E = 350 keV, τ = 90 ns) on the target, the micro-arc effects on the substrate surface are observed at a dc bias potential of more than -60 V. The transition to pulses of 0.5 μs duration enabled to increase the bias potential up to -4 kV. The possibility of application of the high-frequency, short-pulse bias potentials for the formation of coatings from vacuum-arc and blation plasma with high adhesive strength and improved exploitation characteristics is discussed
Veröffentlicht: 2010
Schlagworte:
труды учёных ТПУ
Format: Buchkapitel
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=226259

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